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Copyright © 2020 tec5USA | 80 Skyline Drive , Plainview, NY | Phone: (516) 653-2000

Semiconductor equipment & Thin-film

Spectroscopy provides quality in-line or at-line control measurements via contactless, non-destructive measurements of wafers.
Thousands of our systems are used to control dry etching processes (plasma end-point detection) or inspect layer thickness (ellipsometry). Sophisticated fitting algorithms enable calculation of the layer thickness down to the nanometer scale. Fast, reliable high-sensitivity data acquisition systems by tec5USA guarantee minimum measurement times for high sample throughput.

Further applications include wet etching process monitoring via concentration measurements or material analysis by Raman spectroscopy.

Thin-film Measurement

Plasma Emission Monitoring

Raman Spectroscopy for the Semiconductor Industry